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Issue DateTitleAuthor(s)
2002-01A study on the microstructure and property development of d.c. magnetron co-sputtered ternary titanium aluminium nitirde cpatings: Part 111 Effect of substrate bias voltage and temperatureWuhrer, R; Yeung, WY
2006-01-01X-ray diffraction analysis on crystallite development of nanostructured aluminiumMeijer, E; Armstrong, N; Yeung, WY; Sung, JH; Lee, CG; You, YZ; Lee, YK; Kim, JY
2006-01High temperature behaviour of magnetron sputtered nanocrystalline titanium aluminium nitride coatingsYeung, WY; Wuhrer, R; Attard, D
2007-01-01Modelling of nitrogen deposition pressure effect on grain size development and mechanical properties of nanocrystalline ternary nitride coatingsWuhrer, R; Yeung, WY; Chandra, T; Tsuzaki, K; Militzer, M; Ravindran, C
2005-01-01Magnetron co-sputtering of nanostructured chromium aluminium nitride coatingsWuhrer, R; Yeung, WY; Zhong, ZY; Saka, H; Kim, TH; Holm, EA; Han, YF; Xie, XS
2006-12-01X-ray mapping of metallic elements in roll bonded metal laminatesWuhrer, R; Lee, M; Moran, K; Yeung, WY
2004-06-01A comparative study of magnetron co-sputtered nanocrystalline titanium aluminium and chromium aluminium nitride coatingsWuhrer, R; Yeung, WY
2003-01On the microstructure and property development of d.c. magnetron co-sputtered ternary titanium aluminium nitride coatings: effect of nitrogen deposition pressureWuhrer, R; Yeung, WY
2003-07-18On production of nanocrystalline ternary nitride coatings via magnetron sputteringWuhrer, R; McCredie, G; Yeung, WY
2003-01An empirical relationship between nitrogen deposition pressure and hardness of magnetron co-sputtered ternary nitride coatingsYeung, WY; Wuhrer, R
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