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Issue Date	Title	Author(s)
2002-01	A study on the microstructure and property development of d.c. magnetron co-sputtered ternary titanium aluminium nitirde cpatings: Part 111 Effect of substrate bias voltage and temperature	Wuhrer, R; Yeung, WY
2006-01-01	X-ray diffraction analysis on crystallite development of nanostructured aluminium	Meijer, E; Armstrong, N; Yeung, WY; Sung, JH; Lee, CG; You, YZ; Lee, YK; Kim, JY
2006-01	High temperature behaviour of magnetron sputtered nanocrystalline titanium aluminium nitride coatings	Yeung, WY; Wuhrer, R; Attard, D
2007-01-01	Modelling of nitrogen deposition pressure effect on grain size development and mechanical properties of nanocrystalline ternary nitride coatings	Wuhrer, R; Yeung, WY; Chandra, T; Tsuzaki, K; Militzer, M; Ravindran, C
2005-01-01	Magnetron co-sputtering of nanostructured chromium aluminium nitride coatings	Wuhrer, R; Yeung, WY; Zhong, ZY; Saka, H; Kim, TH; Holm, EA; Han, YF; Xie, XS
2006-12-01	X-ray mapping of metallic elements in roll bonded metal laminates	Wuhrer, R; Lee, M; Moran, K; Yeung, WY
2004-06-01	A comparative study of magnetron co-sputtered nanocrystalline titanium aluminium and chromium aluminium nitride coatings	Wuhrer, R; Yeung, WY
2003-01	On the microstructure and property development of d.c. magnetron co-sputtered ternary titanium aluminium nitride coatings: effect of nitrogen deposition pressure	Wuhrer, R; Yeung, WY
2003-07-18	On production of nanocrystalline ternary nitride coatings via magnetron sputtering	Wuhrer, R; McCredie, G; Yeung, WY
2003-01	An empirical relationship between nitrogen deposition pressure and hardness of magnetron co-sputtered ternary nitride coatings	Yeung, WY; Wuhrer, R

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