The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors

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Show simple item record Solina, DM Cheary, RW Swift, PD McCredie, G 2009-06-26T04:10:29Z 2003-01
dc.identifier.citation Thin Solid Films, 2003, 423 (1), pp. 1 - 12
dc.identifier.issn 0040-6090
dc.identifier.other C1 en_US
dc.description.abstract An investigation has been carried out to determine the conditions required for the fabrication of stable SiO2Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO2. As a preliminary investigation, single layers of Pt on SiO2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the PtSiO2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO2Pt multilayers fabricated with a period d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO2 layers are incompletely oxidised and have a composition SiOx (x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiOx to SiO2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtOx (x<1). SiO2/PtOx multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtOx layer is less that 1012 Å.
dc.publisher Elsevier Science Sa
dc.relation.isbasedon 10.1016/S0040-6090(02)00360-7
dc.title The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors
dc.type Journal Article
dc.parent Thin Solid Films
dc.journal.volume 1
dc.journal.volume 423
dc.journal.number 1 en_US
dc.publocation Lausanne, Switzerland en_US
dc.identifier.startpage 1 en_US
dc.identifier.endpage 12 en_US SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 0204 Condensed Matter Physics
dc.personcode 723559
dc.personcode 900566
dc.personcode 820131
dc.personcode 101110
dc.percentage 100 en_US Condensed Matter Physics en_US
dc.classification.type FOR-08 en_US
dc.description.keywords multilayers, platinum, X-ray photoelectron spectroscopy, X-ray total reflection analysisThin-films; Dioxide Films; Reflectivity; Surfaces; Optics; Oxygen; Spectroscopy; Performance; Stability; Layers en_US
dc.description.keywords endosulfan, fate, toxicity, Australia, aquatic ecosystems
dc.description.keywords multilayers, platinum, X-ray photoelectron spectroscopy, X-ray total reflection analysisThin-films
dc.description.keywords Dioxide Films
dc.description.keywords Reflectivity
dc.description.keywords Surfaces
dc.description.keywords Optics
dc.description.keywords Oxygen
dc.description.keywords Spectroscopy
dc.description.keywords Performance
dc.description.keywords Stability
dc.description.keywords Layers
pubs.embargo.period Not known
pubs.organisational-group /University of Technology Sydney
pubs.organisational-group /University of Technology Sydney/Faculty of Science
utslib.copyright.status Closed Access 2015-04-15 12:17:09.805752+10
utslib.collection.history General Collection (ID: 346) [2015-05-15T14:11:03+10:00]
utslib.collection.history Closed (ID: 3)

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