Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy

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dc.contributor.author Toth, M
dc.contributor.author Lobo, CJ
dc.contributor.author Knowles, WR
dc.contributor.author Phillips, MR
dc.contributor.author Postek, MT
dc.contributor.author Vladár, AE
dc.date.accessioned 2009-12-21T02:33:00Z
dc.date.issued 2007-02
dc.identifier.citation Nano Letters, 2007, 7 (2), pp. 525 - 530
dc.identifier.issn 1530-6984
dc.identifier.other C1 en_US
dc.identifier.uri http://hdl.handle.net/10453/4358
dc.description.abstract Electron beam induced deposition (EBID) is a maskless nanofabrication technique capable of surpassing the resolution limits of resist-based lithography. However, EBID fabrication of functional nanostructures is limited by beam spread in bulk substrates, substrate charging, and delocalized film growth around deposits. Here, we overcome these problems by using environmental scanning electron microscopy (ESEM) to perform EBID and etching while eliminating charging artifacts at the nanoscale. Nanostructure morphology is tailored by slimming of deposits by ESEM imaging in the presence of a gaseous etch precursor and by pre-etching small features into a deposit (using a stationary or a scanned electron beam) prior to a final imaging process. The utility of this process is demonstrated by slimming of nanowires deposited by EBID, by the fabrication of gaps (between 4 and 7 nm wide) in the wires, and by the removal of thin films surrounding such nanowires. ESEM imaging provides a direct view of the slimming process, yielding process resolution that is limited by ESEM image resolution (~1 nm) and surface roughening occurring during etching. © 2007 American Chemical Society.
dc.language eng
dc.relation.isbasedon 10.1021/nl062848c
dc.title Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy
dc.type Journal Article
dc.description.version Published
dc.parent Nano Letters
dc.journal.volume 2
dc.journal.volume 7
dc.journal.number 2 en_US
dc.publocation Washington DC, USA en_US
dc.identifier.startpage 525 en_US
dc.identifier.endpage 530 en_US
dc.cauo.name SCI.Faculty of Science en_US
dc.conference Verified OK en_US
dc.for 0912 Materials Engineering
dc.personcode 810070
dc.personcode 112289
dc.personcode 999509
dc.percentage 100 en_US
dc.classification.name Materials Engineering en_US
dc.classification.type FOR-08 en_US
pubs.embargo.period Not known
pubs.organisational-group /University of Technology Sydney
pubs.organisational-group /University of Technology Sydney/Faculty of Science
pubs.organisational-group /University of Technology Sydney/Strength - Materials and Technology for Energy Efficiency
utslib.copyright.status Closed Access
utslib.copyright.date 2015-04-15 12:17:09.805752+10
utslib.collection.history Closed (ID: 3)
utslib.collection.history School of Physics and Advanced Materials (ID: 343)


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