The effect of plasma immersion ion implantation on the contact pressure and composition of titanium nitride thin films

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dc.contributor.author Lim, SHN
dc.contributor.author McCulloch, DG
dc.contributor.author Bilek, MMM
dc.contributor.author McKenzie, DR
dc.contributor.author du Plessis, J
dc.contributor.author Swain, MV
dc.contributor.author Wuhrer, R
dc.date.accessioned 2009-06-26T04:10:50Z
dc.date.issued 2006-09-12
dc.identifier.citation Surface and Coatings Technology, 2006, 201 (1-2), pp. 396 - 400
dc.identifier.issn 0257-8972
dc.identifier.other C1 en_US
dc.identifier.uri http://hdl.handle.net/10453/544
dc.description.abstract The effect of plasma immersion ion implantation on the indentation hardness as measured by contact pressure and composition of cathodic arc deposited TiN thin films was investigated. According to Auger electron spectroscopy results, increasing the pulse bias voltage up to 18 kV has little effect on the composition of the TiN films. The nano-indentation hardness of the films was found to decrease linearly with increasing pulse bias voltage as the intrinsic stress within the films decreases. A model, based on the columnar microstructure observed in our TiN films, has been developed to explain the dependence of indentation hardness on stress. © 2005 Elsevier B.V. All rights reserved.
dc.language eng
dc.relation.isbasedon 10.1016/j.surfcoat.2005.11.141
dc.title The effect of plasma immersion ion implantation on the contact pressure and composition of titanium nitride thin films
dc.type Journal Article
dc.parent Surface and Coatings Technology
dc.journal.volume 1-2
dc.journal.volume 201
dc.journal.number 1-2 en_US
dc.publocation Lausanne, Switzerland en_US
dc.publocation Dordrecht The Netherlands
dc.identifier.startpage 396 en_US
dc.identifier.endpage 400 en_US
dc.cauo.name SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 0306 Physical Chemistry (Incl. Structural)
dc.personcode 880536
dc.percentage 100 en_US
dc.classification.name Physical Chemistry (incl. Structural en_US
dc.classification.type FOR-08 en_US
dc.edition 1
dc.description.keywords Cathodic arc
dc.description.keywords Composition
dc.description.keywords Indentation hardness
dc.description.keywords Plasma immersion ion implantation
dc.description.keywords Titanium nitride
pubs.embargo.period Not known
pubs.organisational-group /University of Technology Sydney
pubs.organisational-group /University of Technology Sydney/Faculty of Science
utslib.copyright.status Closed Access
utslib.copyright.date 2015-04-15 12:17:09.805752+10
pubs.consider-herdc true
utslib.collection.history Closed (ID: 3)
utslib.collection.history General Collection (ID: 346) [2015-05-15T14:11:11+10:00]


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