Direct Comparison of Various Gaseous Secondary Electron Detectors in the Variable Pressure Scanning Electron Microscope

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Show simple item record Phillips, M Morgan, SW
dc.contributor.editor al, RPE 2009-06-26T04:16:21Z 2005-01
dc.identifier.citation Proceeding Microscopy and Microanalysis vol 11 (Suppl 2), 2005, 11 pp. 398 - 399
dc.identifier.issn 1431-9276
dc.identifier.other E1UNSUBMIT en_US
dc.description.abstract The conventional Everhart-Thornely scintillation-photomultiplier secondary electron (SE) detector cannot function at elevated pressures due to the high voltage (~ +12kV) involved in its operation. As a result, SE imaging in the variable pressure scanning electron microscope (VPSEM) has required the development of a new generation of SE detectors that operate under low vacuum conditions. To date, three different methods have been devised to measure the secondary electron (SE) emission signal in a VPSEM. Each of these approaches involves the excitation of the chamber gas by the placement of a low voltage (< +1000V) positively biased electrode in the vicinity of the specimen. A SE image can be obtained by measuring the current induced in either the positive electrode (the gaseous secondary electron detector) or the grounded stage (the ion current detector) or via a photomultiplier that detects light emission from the gas (the gas luminescence detector). In this work, the performance of each of these three low vacuum SE detector types has been compared under identical operating conditions using a Zeiss Supra 55VPSEM and FEI XL30 ESEM.
dc.publisher Cambridge University Press
dc.relation.isbasedon 10.1017/S1431927605507992
dc.subject NA, Microscopy
dc.subject NA; Microscopy
dc.title Direct Comparison of Various Gaseous Secondary Electron Detectors in the Variable Pressure Scanning Electron Microscope
dc.type Conference Proceeding
dc.parent Proceeding Microscopy and Microanalysis vol 11 (Suppl 2)
dc.journal.volume 11
dc.journal.number en_US
dc.publocation United Kingdom en_US
dc.publocation United Kingdom
dc.identifier.startpage 398 en_US
dc.identifier.endpage 399 en_US SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.conference Microscopy and Microanalysis
dc.conference.location Honolulu Hawaii en_US
dc.for 1007 Nanotechnology
dc.personcode 810070 en_US
dc.personcode 96088947 en_US
dc.percentage 100 en_US Condensed Matter Physics en_US
dc.classification.type FOR-08 en_US
dc.custom Microscopy and Microanalysis en_US 20050731 en_US 2005-07-31
dc.location.activity Honolulu, Hawaii en_US
dc.location.activity Honolulu, Hawaii
dc.description.keywords NA en_US
dc.description.keywords NA
dc.staffid 040207 en_US
pubs.embargo.period Not known
pubs.organisational-group /University of Technology Sydney
pubs.organisational-group /University of Technology Sydney/Faculty of Science
pubs.organisational-group /University of Technology Sydney/Strength - Materials and Technology for Energy Efficiency

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