Direct nanoengineering and lithographic patterning of optically anisotropic thin films

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Show simple item record Hodgkinson, IJ Wu, QH Arnold, MD Blaikie, RJ 2010-05-28T09:42:37Z 2001-01
dc.identifier.citation Microelectronic Engineering, 2001, 57-58 pp. 833 - 836
dc.identifier.issn 0167-9317
dc.identifier.other C1UNSUBMIT en_US
dc.description.abstract Biaxial and chiral thin films formed by oblique vapour deposition are patterned using standard photolithography. In one example 5 ?m wide half-wave plates are fabricated by reactive ion etching a biaxial silicon film.
dc.format Y
dc.publisher Elsevier
dc.relation.isbasedon 10.1016/S0167-9317(01)00440-3
dc.title Direct nanoengineering and lithographic patterning of optically anisotropic thin films
dc.type Journal Article
dc.parent Microelectronic Engineering
dc.journal.volume 57-58
dc.journal.number en_US
dc.publocation Amsterdam, The Netherlands en_US
dc.identifier.startpage 833 en_US
dc.identifier.endpage 836 en_US SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 020504 Photonics, Optoelectronics and Optical Communications
dc.personcode 999147
dc.percentage 100 en_US Photonics, Optoelectronics and Optical Communications en_US
dc.classification.type FOR-08 en_US
dc.edition en_US
dc.custom en_US en_US
dc.location.activity en_US
dc.description.keywords Birefringence
dc.description.keywords Chiral film
dc.description.keywords Lithography
dc.description.keywords Reactive ion etching
dc.description.keywords Thin film
pubs.embargo.period Not known
pubs.organisational-group /University of Technology Sydney
pubs.organisational-group /University of Technology Sydney/Faculty of Science
utslib.copyright.status Closed Access 2015-04-15 12:17:09.805752+10
pubs.consider-herdc false
utslib.collection.history School of Physics and Advanced Materials (ID: 343)
utslib.collection.history Closed (ID: 3)

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