Electron Flux Controlled Switching Between Electron Beam Induced Etching And Deposition

Publisher:
Amer Inst Physics
Publication Type:
Journal article
Citation:
Toth Milos et al. 2007, 'Electron Flux Controlled Switching Between Electron Beam Induced Etching And Deposition', Amer Inst Physics, vol. 101, no. 5, pp. 054309-1-054309-6.
Issue Date:
2007
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Electron beam induced deposition (EBID) and etching (EBIE) are promising methods for the fabrication of three-dimensional nanodevices, wiring of nanostructures, and repair of photolithographic masks. Here, we study simultaneous EBID and EBIE, and demonst
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