Cryogenic plasmas for controlled processing of nanoporous materials

Iacopi, F; Choi, JH; Terashima, K; Rice, PM; Dubois, G

Cryogenic plasmas for controlled processing of nanoporous materials

Iacopi, F

Choi, JH Terashima, K Rice, PM Dubois, G

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Publication Type:: Journal Article
Citation:: Physical Chemistry Chemical Physics, 2011, 13 (9), pp. 3634 - 3637
Issue Date:: 2011-03-07

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Field	Value	Language
dc.contributor.author	Iacopi, F https://orcid.org/0000-0002-3196-0990	en_US
dc.contributor.author	Choi, JH	en_US
dc.contributor.author	Terashima, K	en_US
dc.contributor.author	Rice, PM	en_US
dc.contributor.author	Dubois, G	en_US
dc.date.issued	2011-03-07	en_US
dc.identifier.citation	Physical Chemistry Chemical Physics, 2011, 13 (9), pp. 3634 - 3637	en_US
dc.identifier.issn	1463-9076	en_US
dc.identifier.uri	http://hdl.handle.net/10453/116594
dc.description.abstract	Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species. © the Owner Societies 2011.	en_US
dc.relation.ispartof	Physical Chemistry Chemical Physics	en_US
dc.relation.isbasedon	10.1039/c0cp02660c	en_US
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.classification	Chemical Physics	en_US
dc.subject.mesh	Free Radicals	en_US
dc.subject.mesh	Temperature	en_US
dc.subject.mesh	Adsorption	en_US
dc.subject.mesh	Porosity	en_US
dc.subject.mesh	Nanostructures	en_US
dc.title	Cryogenic plasmas for controlled processing of nanoporous materials	en_US
dc.type	Journal Article
utslib.citation.volume	9	en_US
utslib.citation.volume	13	en_US
utslib.for	030302 Nanochemistry and Supramolecular Chemistry	en_US
utslib.for	029999 Physical Sciences not elsewhere classified	en_US
utslib.for	02 Physical Sciences	en_US
utslib.for	03 Chemical Sciences	en_US
utslib.for	09 Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology/School of Electrical and Data Engineering
utslib.copyright.status	closed_access	*
pubs.issue	9	en_US
pubs.publication-status	Published	en_US
pubs.volume	13	en_US

Abstract:

Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species. © the Owner Societies 2011.

Please use this identifier to cite or link to this item:

http://hdl.handle.net/10453/116594