Cryogenic plasmas for controlled processing of nanoporous materials

Publication Type:
Journal Article
Physical Chemistry Chemical Physics, 2011, 13 (9), pp. 3634 - 3637
Issue Date:
Filename Description Size
P51_PhysChemChemPhys_2011.pdfPublished Version409.13 kB
Adobe PDF
Full metadata record
Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species. © the Owner Societies 2011.
Please use this identifier to cite or link to this item: