Cryogenic plasmas for controlled processing of nanoporous materials.

Publication Type:
Journal Article
Citation:
Phys Chem Chem Phys, 2011, 13 (9), pp. 3634 - 3637
Issue Date:
2011-03-07
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Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species.
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