Photolysis and UV/H<inf>2</inf>O<inf>2</inf> of diclofenac, sulfamethoxazole, carbamazepine, and trimethoprim: Identification of their major degradation products by ESI–LC–MS and assessment of the toxicity of reaction mixtures

Alharbi, SK; Kang, J; Nghiem, LD; van de Merwe, JP; Leusch, FDL; Price, WE

Photolysis and UV/H<inf>2</inf>O<inf>2</inf> of diclofenac, sulfamethoxazole, carbamazepine, and trimethoprim: Identification of their major degradation products by ESI–LC–MS and assessment of the toxicity of reaction mixtures

Alharbi, SK Kang, J Nghiem, LD

van de Merwe, JP Leusch, FDL Price, WE

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Publication Type:: Journal Article
Citation:: Process Safety and Environmental Protection, 2017, 112 pp. 222 - 234
Issue Date:: 2017-11-01

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Field	Value	Language
dc.contributor.author	Alharbi, SK	en_US
dc.contributor.author	Kang, J	en_US
dc.contributor.author	Nghiem, LD https://orcid.org/0000-0002-9039-5792	en_US
dc.contributor.author	van de Merwe, JP	en_US
dc.contributor.author	Leusch, FDL	en_US
dc.contributor.author	Price, WE	en_US
dc.date.issued	2017-11-01	en_US
dc.identifier.citation	Process Safety and Environmental Protection, 2017, 112 pp. 222 - 234	en_US
dc.identifier.issn	0957-5820	en_US
dc.identifier.uri	http://hdl.handle.net/10453/125043
dc.description.abstract	© 2017 Institution of Chemical Engineers The photolysis of diclofenac (DCF), sulfamethoxazole (SMX), carbamazepine (CBZ), and trimethoprim (TMP) was investigated using a low-pressure (LP) mercury ultraviolet (UV) lamp (254 nm) and a combination of UV with hydrogen peroxide (H2O2). For each experiment, 5 mg/L of each pharmaceutical was prepared in pure water and individually degraded by either UV alone or UV/H2O2. DCF and SMX were highly susceptible to UV treatment and completely degraded to below their LC–MS detection limit (1 μg/L) after only 8 min of UV irradiation. TMP and CBZ were more resistant to UV treatment, with only 58.2 and 25.2% degradation (after 1 h UV exposure). The combination of H2O2 addition (up to 0.2 g/L) with UV significantly improved the removal rate of TMP and CBZ up to 91.2 and 99.7% of the initial concentration, respectively. A number of novel transformation compounds were identified as UV or UV/H2O2 degradation products using LC–MS. The range and amount of these transformation compounds strongly depended on the applied treatment conditions. The toxicity of each pharmaceutical solution before and after treatment was also evaluated and all parent compounds were non-toxic at the tested concentration (i.e. 5 mg/L). DCF, in particular, but also CBZ and SMX, showed an increase in solution toxicity after treatment with UV only, indicating the presence of photolytic degradation products that are more toxic than the parent compounds. Treatment with UV/H2O2 reduced the toxicity of all solutions to below the detection limit of the assay.	en_US
dc.relation.ispartof	Process Safety and Environmental Protection	en_US
dc.relation.isbasedon	10.1016/j.psep.2017.07.015	en_US
dc.subject.classification	Strategic, Defence & Security Studies	en_US
dc.subject.classification	Chemical Engineering	en_US
dc.title	Photolysis and UV/H<inf>2</inf>O<inf>2</inf> of diclofenac, sulfamethoxazole, carbamazepine, and trimethoprim: Identification of their major degradation products by ESI–LC–MS and assessment of the toxicity of reaction mixtures	en_US
dc.type	Journal Article
utslib.citation.volume	112	en_US
utslib.for	0904 Chemical Engineering	en_US
utslib.for	0914 Resources Engineering and Extractive Metallurgy	en_US
utslib.for	0102 Applied Mathematics	en_US
utslib.for	0911 Maritime Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology/School of Civil and Environmental Engineering
pubs.organisational-group	/University of Technology Sydney/Strength - CTWW - Centre for Technology in Water and Wastewater Treatment
utslib.copyright.status	closed_access
pubs.publication-status	Published	en_US
pubs.volume	112	en_US

Abstract:

© 2017 Institution of Chemical Engineers The photolysis of diclofenac (DCF), sulfamethoxazole (SMX), carbamazepine (CBZ), and trimethoprim (TMP) was investigated using a low-pressure (LP) mercury ultraviolet (UV) lamp (254 nm) and a combination of UV with hydrogen peroxide (H2O2). For each experiment, 5 mg/L of each pharmaceutical was prepared in pure water and individually degraded by either UV alone or UV/H2O2. DCF and SMX were highly susceptible to UV treatment and completely degraded to below their LC–MS detection limit (1 μg/L) after only 8 min of UV irradiation. TMP and CBZ were more resistant to UV treatment, with only 58.2 and 25.2% degradation (after 1 h UV exposure). The combination of H2O2 addition (up to 0.2 g/L) with UV significantly improved the removal rate of TMP and CBZ up to 91.2 and 99.7% of the initial concentration, respectively. A number of novel transformation compounds were identified as UV or UV/H2O2 degradation products using LC–MS. The range and amount of these transformation compounds strongly depended on the applied treatment conditions. The toxicity of each pharmaceutical solution before and after treatment was also evaluated and all parent compounds were non-toxic at the tested concentration (i.e. 5 mg/L). DCF, in particular, but also CBZ and SMX, showed an increase in solution toxicity after treatment with UV only, indicating the presence of photolytic degradation products that are more toxic than the parent compounds. Treatment with UV/H2O2 reduced the toxicity of all solutions to below the detection limit of the assay.

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http://hdl.handle.net/10453/125043