Role of Surfactants in Facet Dependent Synthesis of Anisotropic Nanostructures

Bentham Books
Publication Type:
Chemical Modification of Solid Surfaces by the Use of Additives, 2021, pp. 1-20
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Anisotropic nanostructures (ANs) are increasingly attractive materials in the ongoing decades due to their direction-dependent properties associated with them. The materialization of ANs is highly delicate, where sharp edges and vertices synthesis are very crucial. There are a few factors play an important role in the synthesis of ANs such as surfactants, pH, temperature, etchants, choice of reducing agent, metal precursor, light, the time duration of the reaction, solvent etc. In the present chapter, the most part centers on how surfactants affect the growth of ANs. Although several surfactants are used for the synthesis of ANs, however, we have focused on the surfactants particularly used for the synthesis of Au, Ag and Cu nanostructures such as Cetyltrimethylammonium bromide (CTAB), Polyvinylpyrrolidone (PVP), Cetyltrimethylammonium chloride (CTAC) and also binary surfactant mixture. An overview of various types of surfactants, the importance of the choice of surfactant, which is necessary for the synthesis of the particular nanostructure is presented. Also, change in nanostructure formation with the change in percentage assay of surfactant is discussed. The contemporary strategies and advantages of binary surfactant mixture over the mono-surfactant are comprehensively reviewed. Finally, the challenges and future outlook for the synthesis of particular nanostructure with required size and morphology are highlighted.
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