Computational pattern making from 3D garment models

Pietroni, N; Dumery, C; Falque, R; Liu, M; Vidal-Calleja, T; Sorkine-Hornung, O

Computational pattern making from 3D garment models

Pietroni, N

Dumery, C Falque, R Liu, M Vidal-Calleja, T Sorkine-Hornung, O

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Publisher:: Association for Computing Machinery (ACM)
Publication Type:: Journal Article
Citation:: ACM Transactions on Graphics, 2022, 41, (4), pp. 1-14
Issue Date:: 2022-07-01

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Field	Value	Language
dc.contributor.author	Pietroni, N https://orcid.org/0000-0002-8271-2102
dc.contributor.author	Dumery, C
dc.contributor.author	Falque, R
dc.contributor.author	Liu, M
dc.contributor.author	Vidal-Calleja, T
dc.contributor.author	Sorkine-Hornung, O
dc.date.accessioned	2022-08-02T16:26:04Z
dc.date.available	2022-08-02T16:26:04Z
dc.date.issued	2022-07-01
dc.identifier.citation	ACM Transactions on Graphics, 2022, 41, (4), pp. 1-14
dc.identifier.issn	0730-0301
dc.identifier.issn	1557-7368
dc.identifier.uri	http://hdl.handle.net/10453/159497
dc.description.abstract	<jats:p>We propose a method for computing a sewing pattern of a given 3D garment model. Our algorithm segments an input 3D garment shape into patches and computes their 2D parameterization, resulting in pattern pieces that can be cut out of fabric and sewn together to manufacture the garment. Unlike the general state-of-the-art approaches for surface cutting and flattening, our method explicitly targets garment fabrication. It accounts for the unique properties and constraints of tailoring, such as seam symmetry, the usage of darts, fabric grain alignment, and a flattening distortion measure that models woven fabric deformation, respecting its anisotropic behavior. We bootstrap a recent patch layout approach developed for quadrilateral remeshing and adapt it to the purpose of computational pattern making, ensuring that the deformation of each pattern piece stays within prescribed bounds of cloth stress. While our algorithm can automatically produce the sewing patterns, it is fast enough to admit user input to creatively iterate on the pattern design. Our method can take several target poses of the 3D garment into account and integrate them into the sewing pattern design. We demonstrate results on both skintight and loose garments, showcasing the versatile application possibilities of our approach.</jats:p>
dc.language	en
dc.publisher	Association for Computing Machinery (ACM)
dc.relation.ispartof	ACM Transactions on Graphics
dc.relation.isbasedon	10.1145/3528223.3530145
dc.rights	info:eu-repo/semantics/openAccess
dc.subject	0801 Artificial Intelligence and Image Processing, 0806 Information Systems
dc.subject.classification	Software Engineering
dc.title	Computational pattern making from 3D garment models
dc.type	Journal Article
utslib.citation.volume	41
utslib.for	0801 Artificial Intelligence and Image Processing
utslib.for	0806 Information Systems
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology/School of Computer Science
utslib.copyright.status	open_access	*
dc.date.updated	2022-08-02T16:24:39Z
pubs.issue	4
pubs.publication-status	Published
pubs.volume	41
utslib.citation.issue	4

Abstract:

We propose a method for computing a sewing pattern of a given 3D garment model. Our algorithm segments an input 3D garment shape into patches and computes their 2D parameterization, resulting in pattern pieces that can be cut out of fabric and sewn together to manufacture the garment. Unlike the general state-of-the-art approaches for surface cutting and flattening, our method explicitly targets garment fabrication. It accounts for the unique properties and constraints of tailoring, such as seam symmetry, the usage of darts, fabric grain alignment, and a flattening distortion measure that models woven fabric deformation, respecting its anisotropic behavior. We bootstrap a recent patch layout approach developed for quadrilateral remeshing and adapt it to the purpose of computational pattern making, ensuring that the deformation of each pattern piece stays within prescribed bounds of cloth stress. While our algorithm can automatically produce the sewing patterns, it is fast enough to admit user input to creatively iterate on the pattern design. Our method can take several target poses of the 3D garment into account and integrate them into the sewing pattern design. We demonstrate results on both skintight and loose garments, showcasing the versatile application possibilities of our approach.

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http://hdl.handle.net/10453/159497