Cathodic arc deposition of high entropy alloy thin films with controllable microstructure

Zhao, H; Zheng, Z; Zhou, H; Chang, L; Tsoutas, K; Yang, L; Alavi, SK; Liu, Y; Akhavan, B; Bilek, MM; Liu, Z

Cathodic arc deposition of high entropy alloy thin films with controllable microstructure

Zhao, H Zheng, Z Zhou, H Chang, L Tsoutas, K Yang, L

Alavi, SK Liu, Y Akhavan, B Bilek, MM Liu, Z

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Publisher:: ELSEVIER
Publication Type:: Journal Article
Citation:: Surfaces and Interfaces, 2023, 37
Issue Date:: 2023-04-01

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Field	Value	Language
dc.contributor.author	Zhao, H
dc.contributor.author	Zheng, Z
dc.contributor.author	Zhou, H
dc.contributor.author	Chang, L
dc.contributor.author	Tsoutas, K
dc.contributor.author	Yang, L https://orcid.org/0000-0003-0123-1540
dc.contributor.author	Alavi, SK
dc.contributor.author	Liu, Y
dc.contributor.author	Akhavan, B
dc.contributor.author	Bilek, MM
dc.contributor.author	Liu, Z
dc.date.accessioned	2024-03-20T01:51:59Z
dc.date.available	2024-03-20T01:51:59Z
dc.date.issued	2023-04-01
dc.identifier.citation	Surfaces and Interfaces, 2023, 37
dc.identifier.issn	2468-0230
dc.identifier.uri	http://hdl.handle.net/10453/176940
dc.description.abstract	High entropy alloys (HEAs) are a novel class of materials exhibiting properties of high strength, high corrosion and oxidation resistance, and superb thermal stability. Cathodic arc deposition is an established physical vapor deposition (PVD) technology offering high deposition rate and high degrees of plasma ionization with controllable ion kinetic energy. Here we employed cathodic arc deposition to fabricate AlCrFeCoNiCu0.5 HEA thin films. To elucidate the growth mechanisms and microstructures of the HEA thin film microstructures, we varied arc and duct currents. The crystallography of the films was investigated using X-ray diffraction (XRD). The film chemistry and microstructure of the film-substrate interphase were comprehensively studied using transmission electron microscopy (TEM). Atomic force microscopy (AFM) was applied to study the surface morphology, and mechanical properties were evaluated using nanoindentation. It is demonstrated that the grain size in HEA thin films can be effectively controlled by the deposition rate, while the HEA film hardness and surface roughness are modulated by the grain size. The results presented here have important implications for the fabrication of HEA thin films using cathodic arc deposition as an industrially scalable technique.
dc.language	English
dc.publisher	ELSEVIER
dc.relation.ispartof	Surfaces and Interfaces
dc.relation.isbasedon	10.1016/j.surfin.2023.102692
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.classification	3406 Physical chemistry
dc.subject.classification	4016 Materials engineering
dc.title	Cathodic arc deposition of high entropy alloy thin films with controllable microstructure
dc.type	Journal Article
utslib.citation.volume	37
pubs.organisational-group	University of Technology Sydney
pubs.organisational-group	University of Technology Sydney/Faculty of Engineering and Information Technology
pubs.organisational-group	University of Technology Sydney/Faculty of Engineering and Information Technology/School of Civil and Environmental Engineering
pubs.organisational-group	University of Technology Sydney/Strength - CGT - Centre for Green Technology
utslib.copyright.status	closed_access	*
dc.date.updated	2024-03-20T01:51:55Z
pubs.publication-status	Published
pubs.volume	37

Abstract:

High entropy alloys (HEAs) are a novel class of materials exhibiting properties of high strength, high corrosion and oxidation resistance, and superb thermal stability. Cathodic arc deposition is an established physical vapor deposition (PVD) technology offering high deposition rate and high degrees of plasma ionization with controllable ion kinetic energy. Here we employed cathodic arc deposition to fabricate AlCrFeCoNiCu0.5 HEA thin films. To elucidate the growth mechanisms and microstructures of the HEA thin film microstructures, we varied arc and duct currents. The crystallography of the films was investigated using X-ray diffraction (XRD). The film chemistry and microstructure of the film-substrate interphase were comprehensively studied using transmission electron microscopy (TEM). Atomic force microscopy (AFM) was applied to study the surface morphology, and mechanical properties were evaluated using nanoindentation. It is demonstrated that the grain size in HEA thin films can be effectively controlled by the deposition rate, while the HEA film hardness and surface roughness are modulated by the grain size. The results presented here have important implications for the fabrication of HEA thin films using cathodic arc deposition as an industrially scalable technique.

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http://hdl.handle.net/10453/176940