Direct-write milling of diamond by a focused oxygen ion beam

Martin, AA; Randolph, S; Botman, A; Toth, M; Aharonovich, I

Direct-write milling of diamond by a focused oxygen ion beam

Martin, AA Randolph, S Botman, A Toth, M

Aharonovich, I

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Field	Value	Language
dc.contributor.author	Martin, AA	en_US
dc.contributor.author	Randolph, S	en_US
dc.contributor.author	Botman, A	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.contributor.author	Aharonovich, I https://orcid.org/0000-0003-4304-3935	en_US
dc.identifier.uri	http://hdl.handle.net/10453/100449
dc.description.abstract	Recent advances in focused ion beam technology have enabled high-resolution, direct-write nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on direct-write milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by nonintrusive post-processing methods such as localised electron beam induced chemical etching.	en_US
dc.relation	http://purl.org/au-research/grants/arc/DP140102721
dc.title	Direct-write milling of diamond by a focused oxygen ion beam	en_US
utslib.for	0205 Optical Physics	en_US
utslib.for	1007 Nanotechnology	en_US
utslib.for	0912 Materials Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	open_access

Abstract:

Recent advances in focused ion beam technology have enabled high-resolution, direct-write nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on direct-write milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by nonintrusive post-processing methods such as localised electron beam induced chemical etching.

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http://hdl.handle.net/10453/100449