Control of ion density distribution by magnetic traps for plasma electrons

Publication Type:
Journal Article
Citation:
Journal of Applied Physics, 2012, 112 (7)
Issue Date:
2012-10-01
Full metadata record
Files in This Item:
Filename Description Size
1%2E4757022.pdfPublished Version4.77 MB
Adobe PDF
The effect of a magnetic field of two magnetic coils on the ion current density distribution in the setup for low-temperature plasma deposition is investigated. The substrate of 400 mm diameter is placed at a distance of 325 mm from the plasma duct exit, with the two magnetic coils mounted symmetrically under the substrate at a distance of 140 mm relative to the substrate centre. A planar probe is used to measure the ion current density distribution along the plasma flux cross-sections at distances of 150, 230, and 325 mm from the plasma duct exit. It is shown that the magnetic field strongly affects the ion current density distribution. Transparent plastic films are used to investigate qualitatively the ion density distribution profiles and the effect of the magnetic field. A theoretical model is developed to describe the interaction of the ion fluxes with the negative space charge regions associated with the magnetic trapping of the plasma electrons. Theoretical results are compared with the experimental measurements, and a reasonable agreement is demonstrated. © 2012 American Institute of Physics.
Please use this identifier to cite or link to this item: