Photonic Nanostructures from Hexagonal Boron Nitride

Fröch, JE; Hwang, Y; Kim, S; Aharonovich, I; Toth, M

Photonic Nanostructures from Hexagonal Boron Nitride

Fröch, JE Hwang, Y Kim, S

Aharonovich, I

Toth, M

Permalink

Publication Type:: Journal Article
Citation:: Advanced Optical Materials, 2019, 7 (4)
Issue Date:: 2019-02-19

Closed Access

	Filename	Description	Size
	Fr-ch_et_al-2019-Advanced_Optical_Materials.pdf	Published Version	1.51 MB	Adobe PDF	View/Open

Copyright Clearance Process

Recently Added
In Progress
Closed Access

This item is closed access and not available.

Full metadata record

Field	Value	Language
dc.contributor.author	Fröch, JE	en_US
dc.contributor.author	Hwang, Y	en_US
dc.contributor.author	Kim, S https://orcid.org/0000-0001-9836-3608	en_US
dc.contributor.author	Aharonovich, I https://orcid.org/0000-0003-4304-3935	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.date.issued	2019-02-19	en_US
dc.identifier.citation	Advanced Optical Materials, 2019, 7 (4)	en_US
dc.identifier.uri	http://hdl.handle.net/10453/134055
dc.description.abstract	© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim Growing interest in devices based on layered van der Waals (vdW) materials is motivating the development of new nanofabrication methods. Hexagonal boron nitride (hBN) is one of the most promising materials for studies of quantum photonics and phonon polaritonics. A promising nanofabrication process used to fabricate several hBN photonic devices using a hybrid reactive ion etching (RIE) and electron beam-induced etching (EBIE) technique is reported in detail here. The shortcomings and benefits of RIE and EBIE are highlighted and the utility of the hybrid approach for the fabrication of suspended and supported device structures with nanoscale features and highly vertical sidewalls are demonstrated. Functionality of the fabricated devices is proven by measurements of high-quality cavity optical modes (Q ≈ 1500). This nanofabrication approach constitutes an advance toward an integrated, monolithic quantum photonics platform based on hBN and other layered vdW materials.	en_US
dc.relation	http://purl.org/au-research/grants/arc/DP180100077
dc.relation	http://purl.org/au-research/grants/arc/LP170100150
dc.relation.ispartof	Advanced Optical Materials	en_US
dc.relation.isbasedon	10.1002/adom.201801344	en_US
dc.title	Photonic Nanostructures from Hexagonal Boron Nitride	en_US
dc.type	Journal Article
utslib.citation.volume	4	en_US
utslib.citation.volume	7	en_US
utslib.for	0303 Macromolecular and Materials Chemistry	en_US
utslib.for	1007 Nanotechnology	en_US
utslib.for	0205 Optical Physics	en_US
utslib.for	0906 Electrical and Electronic Engineering	en_US
utslib.for	0912 Materials Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
pubs.organisational-group	/University of Technology Sydney/Students
utslib.copyright.status	closed_access
pubs.issue	4	en_US
pubs.publication-status	Published	en_US
pubs.volume	7	en_US

Abstract:

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim Growing interest in devices based on layered van der Waals (vdW) materials is motivating the development of new nanofabrication methods. Hexagonal boron nitride (hBN) is one of the most promising materials for studies of quantum photonics and phonon polaritonics. A promising nanofabrication process used to fabricate several hBN photonic devices using a hybrid reactive ion etching (RIE) and electron beam-induced etching (EBIE) technique is reported in detail here. The shortcomings and benefits of RIE and EBIE are highlighted and the utility of the hybrid approach for the fabrication of suspended and supported device structures with nanoscale features and highly vertical sidewalls are demonstrated. Functionality of the fabricated devices is proven by measurements of high-quality cavity optical modes (Q ≈ 1500). This nanofabrication approach constitutes an advance toward an integrated, monolithic quantum photonics platform based on hBN and other layered vdW materials.

Please use this identifier to cite or link to this item:

http://hdl.handle.net/10453/134055