Enantioselective recognition of amino acid based on electrochemical deposition and X-ray diffraction technology.

Chong, H; Zhang, G; Wu, Y; Xu, B; Wang, G; Wang, C

Enantioselective recognition of amino acid based on electrochemical deposition and X-ray diffraction technology.

Chong, H Zhang, G Wu, Y Xu, B Wang, G

Wang, C

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Publisher:: ELSEVIER SCIENCE INC
Publication Type:: Journal Article
Citation:: J Inorg Biochem, 2021, 218, pp. 111398
Issue Date:: 2021-05

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Field	Value	Language
dc.contributor.author	Chong, H
dc.contributor.author	Zhang, G
dc.contributor.author	Wu, Y
dc.contributor.author	Xu, B
dc.contributor.author	Wang, G https://orcid.org/0000-0003-4295-8578
dc.contributor.author	Wang, C
dc.date.accessioned	2022-01-31T20:51:27Z
dc.date.available	2021-02-06
dc.date.available	2022-01-31T20:51:27Z
dc.date.issued	2021-05
dc.identifier.citation	J Inorg Biochem, 2021, 218, pp. 111398
dc.identifier.issn	0162-0134
dc.identifier.issn	1873-3344
dc.identifier.uri	http://hdl.handle.net/10453/153966
dc.description.abstract	Addition of D-Asp in the electrochemical deposition process of Bismuth film resulted the generation of a new diffraction peak in X-ray diffraction (XRD) spectrum. This phenomenon was not observed in the situation of L-Asp. The new diffraction peak might suggest D-Asp could result in the generation of a specific Bismuth structure. Enantioselective recognition of D- and L-Asp can be realized based on this new XRD peak. The limit of detection was determined to be 3.5 × 10-8 and 1.7 × 10-8 mol L-1 for D- and L-Asp, respectively. The XRD spectra of electrodeposited Copper films fabricated in the presence of D- or L-Asp showed different lattice plane diffraction peak intensity ratios. The reason was believed to be chirality induced different binding capabilities of Asp enantiomers that influenced Copper film growth. Therefore, the combination of electrochemical deposition using Copper as metal source and XRD technology can be used to achieve enantioselective recognition of Asp. The limit of detection for D- and L-Asp were determined to be 1.5 × 10-10 and 1.2 × 10-11 mol L-1, respectively.
dc.format	Print-Electronic
dc.language	eng
dc.publisher	ELSEVIER SCIENCE INC
dc.relation.ispartof	J Inorg Biochem
dc.relation.isbasedon	10.1016/j.jinorgbio.2021.111398
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject	0302 Inorganic Chemistry, 0307 Theoretical and Computational Chemistry, 0399 Other Chemical Sciences
dc.subject.classification	Inorganic & Nuclear Chemistry
dc.title	Enantioselective recognition of amino acid based on electrochemical deposition and X-ray diffraction technology.
dc.type	Journal Article
utslib.citation.volume	218
utslib.location.activity	United States
utslib.for	0302 Inorganic Chemistry
utslib.for	0307 Theoretical and Computational Chemistry
utslib.for	0399 Other Chemical Sciences
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - CCET - Centre for Clean Energy Technology
utslib.copyright.status	closed_access	*
dc.date.updated	2022-01-31T20:51:25Z
pubs.publication-status	Published
pubs.volume	218

Abstract:

Addition of D-Asp in the electrochemical deposition process of Bismuth film resulted the generation of a new diffraction peak in X-ray diffraction (XRD) spectrum. This phenomenon was not observed in the situation of L-Asp. The new diffraction peak might suggest D-Asp could result in the generation of a specific Bismuth structure. Enantioselective recognition of D- and L-Asp can be realized based on this new XRD peak. The limit of detection was determined to be 3.5 × 10-8 and 1.7 × 10-8 mol L-1 for D- and L-Asp, respectively. The XRD spectra of electrodeposited Copper films fabricated in the presence of D- or L-Asp showed different lattice plane diffraction peak intensity ratios. The reason was believed to be chirality induced different binding capabilities of Asp enantiomers that influenced Copper film growth. Therefore, the combination of electrochemical deposition using Copper as metal source and XRD technology can be used to achieve enantioselective recognition of Asp. The limit of detection for D- and L-Asp were determined to be 1.5 × 10-10 and 1.2 × 10-11 mol L-1, respectively.

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http://hdl.handle.net/10453/153966