Double Etch Method for the Fabrication of Nanophotonic Devices fr om van der Waals Materials

Schaeper, OC; Spencer, L; Scognamiglio, D; El-Sayed, W; Whitefield, B; Horder, J; Coste, N; Barclay, P; Toth, M; Zalogina, A; Aharonovich, I

Double Etch Method for the Fabrication of Nanophotonic Devices fr om van der Waals Materials

Schaeper, OC Spencer, L Scognamiglio, D El-Sayed, W Whitefield, B Horder, J

Coste, N Barclay, P Toth, M

Zalogina, A

Aharonovich, I

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Publisher:: AMER CHEMICAL SOC
Publication Type:: Journal Article
Citation:: ACS Photonics, 2024, 11, (12), pp. 5446-5452
Issue Date:: 2024-12-18

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Field	Value	Language
dc.contributor.author	Schaeper, OC
dc.contributor.author	Spencer, L
dc.contributor.author	Scognamiglio, D
dc.contributor.author	El-Sayed, W
dc.contributor.author	Whitefield, B
dc.contributor.author	Horder, J https://orcid.org/0000-0002-1664-1879
dc.contributor.author	Coste, N
dc.contributor.author	Barclay, P
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899
dc.contributor.author	Zalogina, A https://orcid.org/0000-0003-3956-0585
dc.contributor.author	Aharonovich, I https://orcid.org/0000-0003-4304-3935
dc.date.accessioned	2025-01-13T03:30:33Z
dc.date.available	2025-01-13T03:30:33Z
dc.date.issued	2024-12-18
dc.identifier.citation	ACS Photonics, 2024, 11, (12), pp. 5446-5452
dc.identifier.issn	2330-4022
dc.identifier.issn	2330-4022
dc.identifier.uri	http://hdl.handle.net/10453/183352
dc.description.abstract	The integration of van der Waals (vdW) materials into photonic devices has laid out a foundation for many new quantum and optoelectronic applications. Despite tremendous progress in the nanofabrication of photonic building blocks from vdW crystals, there are still limitations, specifically with large-area devices and masking. Here, we focus on hexagonal boron nitride (hBN) as a vdW material and present a double etch method that overcomes problems associated with methods that employ metallic films and resist-based films for masking. Efficacy of the developed protocol is demonstrated by designing and fabricating a set of functional photonic components─including waveguides, ring resonators, and photonic crystal cavities. The functionality of the fabricated structures is demonstrated through optical characterization over several key spectral ranges. These include the near-infrared and blue ranges, where the hBN boron vacancy (VB-) spin defects and the coherent B center quantum emitters emit, respectively. The double etch method enables fabrication of high-quality factor optical cavities and constitutes a promising pathway toward on-chip integration of vdW materials.
dc.language	English
dc.publisher	AMER CHEMICAL SOC
dc.relation	http://purl.org/au-research/grants/arc/CE200100010
dc.relation	United States Department of the NavyN629092212028
dc.relation	http://purl.org/au-research/grants/arc/FT220100053
dc.relation.ispartof	ACS Photonics
dc.relation.isbasedon	10.1021/acsphotonics.4c02115
dc.rights	info:eu-repo/semantics/embargoedAccess
dc.rights	This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Photonics, copyright ©, [include copyright notice from the published article] after peer review and technical editing by the publisher. final edited and published work see https://doi.org/10.1021/acsphotonics.4c02115
dc.subject	0205 Optical Physics, 0206 Quantum Physics, 0906 Electrical and Electronic Engineering
dc.subject.classification	5102 Atomic, molecular and optical physics
dc.title	Double Etch Method for the Fabrication of Nanophotonic Devices fr om van der Waals Materials
dc.type	Journal Article
utslib.citation.volume	11
utslib.for	0205 Optical Physics
utslib.for	0206 Quantum Physics
utslib.for	0906 Electrical and Electronic Engineering
pubs.organisational-group	University of Technology Sydney
pubs.organisational-group	University of Technology Sydney/Faculty of Science
pubs.organisational-group	University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
utslib.copyright.status	open_access	*
utslib.copyright.embargo	2025-11-20T00:00:00+1000Z
dc.date.updated	2025-01-13T03:30:31Z
pubs.issue	12
pubs.publication-status	Published
pubs.volume	11
utslib.citation.issue	12

Abstract:

The integration of van der Waals (vdW) materials into photonic devices has laid out a foundation for many new quantum and optoelectronic applications. Despite tremendous progress in the nanofabrication of photonic building blocks from vdW crystals, there are still limitations, specifically with large-area devices and masking. Here, we focus on hexagonal boron nitride (hBN) as a vdW material and present a double etch method that overcomes problems associated with methods that employ metallic films and resist-based films for masking. Efficacy of the developed protocol is demonstrated by designing and fabricating a set of functional photonic components─including waveguides, ring resonators, and photonic crystal cavities. The functionality of the fabricated structures is demonstrated through optical characterization over several key spectral ranges. These include the near-infrared and blue ranges, where the hBN boron vacancy (VB-) spin defects and the coherent B center quantum emitters emit, respectively. The double etch method enables fabrication of high-quality factor optical cavities and constitutes a promising pathway toward on-chip integration of vdW materials.

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http://hdl.handle.net/10453/183352