Three-dimensional electron energy deposition modeling of cathodoluminescence emission near threading dislocations in gan and electron-beam lithography exposure parameters for a PMMA resist

Cambridge Univ Press
Publication Type:
Journal Article
Microscopy & Microanalysis, 2012, 18 (6), pp. 1220 - 1228
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The Monte Carlo software CASINO has been expanded with new modules for the simulation of complex beam scanning patterns, for the simulation of cathodoluminescence (CL), and for the calculation of electron energy deposition in subregions of a three-dimens
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