Effects of Magnetron Discharge Power and N2 Flow Rate for Preparation of TiCrN Thin Film

Publication Type:
Journal Article
Procedia Engineering, 2012, 32 pp. 1135 - 1138
Issue Date:
Full metadata record
Files in This Item:
Filename Description Size
Thumbnail2012004695OK.pdf594.05 kB
Adobe PDF
Titanium Chromium Nitride (TiCrN) multilayer coatings on cutting tools, press molds and dies can be used to prolong their life cycle because of their superior corrosion and oxidation resistance. We investigated on three effecting conditions, the magnetron discharging powers of Ti and Cr targets and N2 flow rate. TiCrN multilayer coatings were prepared by dual DC magnetron sputtering. The crystallography and microstructure of the films were investigated by using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The crystalline structures were obtained the cubic and mixed phases of Ti0.5Cr0.5N with the mean lattice parameters of a = b = c = 4.238 Å and TiCrN2 with the mean lattice parameters of a = b = c = 4.1835 Å for the condition of discharging powers on Ti and Cr target, respectively. However, the N2 flow rate condition, the orthorhombic oriented structure occurred with the mean lattice parameters of a = 2.962 Å, b = 4.130 Å and c = 2.875 Å. The morphology of TiCrN thin films show the average grain size ~ 100200 nm, and the thickness of ~1 micron Cr-layer, ~0.5 micron CrN-layer and ~2 micron TiCrN-layer.
Please use this identifier to cite or link to this item: