Direct-write 3D Nanolithography At Cryogenic Temperatures

Publisher:
IOP Publishing Ltd
Publication Type:
Journal Article
Citation:
Nanotechnology, 2013, 24 (3), pp. 1 - 7
Issue Date:
2013-01
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Direct-write three-dimensional nanolithography is demonstrated using cryogenic electron beam-induced deposition (EBID). Cryogenic cooling and an electron beam were used to condense and expose the precursor methylcyclopentadienyl(trimethyl) platinum (MeCp
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