Focused electron beam-induced deposition at cryogenic temperatures

Bresin, M; Thiel, BL; Toth, M; Dunn, KA

Focused electron beam-induced deposition at cryogenic temperatures

Bresin, M Thiel, BL Toth, M

Dunn, KA

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Publication Type:: Journal Article
Citation:: Journal of Materials Research, 2011, 26 (3), pp. 357 - 364
Issue Date:: 2011-02-14

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Field	Value	Language
dc.contributor.author	Bresin, M	en_US
dc.contributor.author	Thiel, BL	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.contributor.author	Dunn, KA	en_US
dc.date.issued	2011-02-14	en_US
dc.identifier.citation	Journal of Materials Research, 2011, 26 (3), pp. 357 - 364	en_US
dc.identifier.issn	0884-2914	en_US
dc.identifier.uri	http://hdl.handle.net/10453/28987
dc.description.abstract	Direct-write, cryogenic electron beam-induced deposition (EBID) was performed by condensing methylcyclopentadienyl-platinum-trimethyl precursor onto a substrate at -155 °C, exposing the condensate by a 15 keV electron beam, and desorbing unexposed precursor molecules by heating the substrate to room temperature. Dependencies of film thickness, microstructure, and surface morphology on electron beam flux and fluence, and Monte Carlo simulations of electron interactions with the condensate are used to construct a model of cryogenic EBID that is contrasted to existing models of conventional, room temperature EBID. It is shown that material grown from a cryogenic condensate exhibits one of three distinct surface morphologies: a nanoporous mesh with a high surface-to-volume ratio; a smooth, continuous film analogous to material typically grown by room temperature EBID; or a film with a high degree of surface roughness, analogous to that of the cryogenic condensate. The surface morphology can be controlled reproducibly by the electron fluence used for exposure. © Materials Research Society 2011.	en_US
dc.relation.ispartof	Journal of Materials Research	en_US
dc.relation.isbasedon	10.1557/jmr.2010.59	en_US
dc.subject.classification	Materials	en_US
dc.title	Focused electron beam-induced deposition at cryogenic temperatures	en_US
dc.type	Journal Article
utslib.citation.volume	3	en_US
utslib.citation.volume	26	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0912 Materials Engineering	en_US
utslib.for	0913 Mechanical Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	closed_access
pubs.issue	3	en_US
pubs.publication-status	Published	en_US
pubs.volume	26	en_US

Abstract:

Direct-write, cryogenic electron beam-induced deposition (EBID) was performed by condensing methylcyclopentadienyl-platinum-trimethyl precursor onto a substrate at -155 °C, exposing the condensate by a 15 keV electron beam, and desorbing unexposed precursor molecules by heating the substrate to room temperature. Dependencies of film thickness, microstructure, and surface morphology on electron beam flux and fluence, and Monte Carlo simulations of electron interactions with the condensate are used to construct a model of cryogenic EBID that is contrasted to existing models of conventional, room temperature EBID. It is shown that material grown from a cryogenic condensate exhibits one of three distinct surface morphologies: a nanoporous mesh with a high surface-to-volume ratio; a smooth, continuous film analogous to material typically grown by room temperature EBID; or a film with a high degree of surface roughness, analogous to that of the cryogenic condensate. The surface morphology can be controlled reproducibly by the electron fluence used for exposure. © Materials Research Society 2011.

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http://hdl.handle.net/10453/28987