Continuum modeling of electron beam induced processes

Lobo, C; Toth, M

Continuum modeling of electron beam induced processes

Lobo, C

Toth, M

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Publisher:: Oxford University Press
Publication Type:: Chapter
Citation:: Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications, 2012, 1, pp. 286 - 320
Issue Date:: 2012-01

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Field	Value	Language
dc.contributor.author	Lobo, C https://orcid.org/0000-0002-2746-1363	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.contributor.editor	Utke, I	en_US
dc.contributor.editor	Moshkalev, SA	en_US
dc.contributor.editor	Russell, P	en_US
dc.date.issued	2012-01	en_US
dc.identifier.citation	Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications, 2012, 1, pp. 286 - 320	en_US
dc.identifier.isbn	9780199734214	en_US
dc.identifier.uri	http://hdl.handle.net/10453/31008
dc.description.abstract	Gas-mediated focused electron beam induced etching (FEBIE) and deposition (FEBID), collectively referred to here as FEBIED, permit nanoscale modification of surface material via chemical reactions involving electron-dissociated precursor molecules. Electrons crossing the solid-vacuum interface usually possess a wide range of energies, are capable of breaking most bonds in typical precursor adsorbates and dissociation products, and can therefore generate a wide range of mobile, chemically active species. Adsorption, desorption, diffusion, and dissociation of these species all contribute to the development of nanostructures fabricated by FEBIED processes. Furthermore, these nanostructures are often electron-sensitive, and thus their structure evolves during deposition. The wide range of processes behind FEBIED yields very complex behavior that is yet to be modeled realistically fifty years after Christy first proposed a simple analytical model of deposition induced by a broad (defocused) electron beam [1]. A complete description of FEBIED requires a realistic model of electron-gas and electron-solid interactions, the spatial and energy distributions of secondary and backscattered electrons, electron interactions with adsorbates, and the behavior of adsorbates and dissociation products at the solid-vacuum interface.	en_US
dc.publisher	Oxford University Press	en_US
dc.relation.ispartof	Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications	en_US
dc.title	Continuum modeling of electron beam induced processes	en_US
dc.type	Chapter
utslib.location	New York, USA	en_US
utslib.for	0912 Materials Engineering	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.citation.edition	1	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	closed_access
pubs.consider-herdc	true	en_US
pubs.edition	1	en_US
pubs.place-of-publication	New York, USA	en_US

Abstract:

Gas-mediated focused electron beam induced etching (FEBIE) and deposition (FEBID), collectively referred to here as FEBIED, permit nanoscale modification of surface material via chemical reactions involving electron-dissociated precursor molecules. Electrons crossing the solid-vacuum interface usually possess a wide range of energies, are capable of breaking most bonds in typical precursor adsorbates and dissociation products, and can therefore generate a wide range of mobile, chemically active species. Adsorption, desorption, diffusion, and dissociation of these species all contribute to the development of nanostructures fabricated by FEBIED processes. Furthermore, these nanostructures are often electron-sensitive, and thus their structure evolves during deposition. The wide range of processes behind FEBIED yields very complex behavior that is yet to be modeled realistically fifty years after Christy first proposed a simple analytical model of deposition induced by a broad (defocused) electron beam [1]. A complete description of FEBIED requires a realistic model of electron-gas and electron-solid interactions, the spatial and energy distributions of secondary and backscattered electrons, electron interactions with adsorbates, and the behavior of adsorbates and dissociation products at the solid-vacuum interface.

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http://hdl.handle.net/10453/31008