Electron beam induced chemical dry etching and imaging in gaseous NH <inf>3</inf> environments

Publication Type:
Journal Article
Citation:
Nanotechnology, 2012, 23 (37)
Issue Date:
2012-09-21
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We report the use of ammonia (NH 3) vapor as a new precursor for nanoscale electron beam induced etching (EBIE) of carbon, and an efficient imaging medium for environmental scanning electron microscopy (ESEM). Etching is demonstrated using amorphous carbonaceous nanowires grown by electron beam induced deposition (EBID). It is ascribed to carbon volatilization by hydrogen radicals generated by electron dissociation of NH 3 adsorbates. The volatilization process is also effective at preventing the buildup of residual hydrocarbon impurities that often compromise EBIE, EBID and electron imaging. We also show that ammonia is a more efficient electron imaging medium than H 2O, which up to now has been the most commonly used ESEM imaging gas. © 2012 IOP Publishing Ltd.
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