Nitride film growth morphology using remote plasma enhanced chemical vapor deposition

Wintrebert-Fouquet, M Butcher, KSA Chen, PP-T Wuhrer, R

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Publisher:: WILEY-V C H VERLAG GMBH
Publication Type:: Journal Article
Citation:: PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4 NO 7 2007, 2007, 4 (7), pp. 2285 - + (2)
Issue Date:: 2007-01-01

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Full metadata record

Field	Value	Language
dc.contributor.author	Wintrebert-Fouquet, M	en_US
dc.contributor.author	Butcher, KSA	en_US
dc.contributor.author	Chen, PP-T	en_US
dc.contributor.author	Wuhrer, R	en_US
dc.date.issued	2007-01-01	en_US
dc.identifier.citation	PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4 NO 7 2007, 2007, 4 (7), pp. 2285 - + (2)	en_US
dc.identifier.issn	1862-6351	en_US
dc.identifier.uri	http://hdl.handle.net/10453/3559
dc.language	English	en_US
dc.publisher	WILEY-V C H VERLAG GMBH	en_US
dc.relation.ispartof	PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4 NO 7 2007	en_US
dc.relation.isbasedon	10.1002/pssc.200674728	en_US
dc.title	Nitride film growth morphology using remote plasma enhanced chemical vapor deposition	en_US
dc.type	Journal Article
utslib.citation.volume	7	en_US
utslib.citation.volume	4	en_US
utslib.location.activity	Kyoto, JAPAN	en_US
utslib.for	0206 Quantum Physics	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0912 Materials Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
utslib.copyright.status	closed_access
pubs.issue	7	en_US
pubs.publication-status	Published	en_US
pubs.volume	4	en_US

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