Continuum models of focused electron beam induced processing

Toth, M; Lobo, C; Friedli, V; Szkudlarek, A; Utke, I

Continuum models of focused electron beam induced processing

Toth, M

Lobo, C

Friedli, V Szkudlarek, A Utke, I

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Publication Type:: Journal Article
Citation:: Beilstein Journal of Nanotechnology, 2015, 6 (1), pp. 1518 - 1540
Issue Date:: 2015-01-01

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Field	Value	Language
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.contributor.author	Lobo, C https://orcid.org/0000-0002-2746-1363	en_US
dc.contributor.author	Friedli, V	en_US
dc.contributor.author	Szkudlarek, A	en_US
dc.contributor.author	Utke, I	en_US
dc.date.available	2015-06-18	en_US
dc.date.issued	2015-01-01	en_US
dc.identifier.citation	Beilstein Journal of Nanotechnology, 2015, 6 (1), pp. 1518 - 1540	en_US
dc.identifier.uri	http://hdl.handle.net/10453/37768
dc.description.abstract	© 2015 Toth et al. Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models.	en_US
dc.relation	http://purl.org/au-research/grants/arc/DP140102721
dc.relation.ispartof	Beilstein Journal of Nanotechnology	en_US
dc.relation.isbasedon	10.3762/bjnano.6.157	en_US
dc.title	Continuum models of focused electron beam induced processing	en_US
dc.type	Journal Article
utslib.citation.volume	1	en_US
utslib.citation.volume	6	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0301 Analytical Chemistry	en_US
utslib.for	0399 Other Chemical Sciences	en_US
utslib.for	1007 Nanotechnology	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	open_access
pubs.issue	1	en_US
pubs.publication-status	Published	en_US
pubs.volume	6	en_US

Abstract:

© 2015 Toth et al. Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models.

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http://hdl.handle.net/10453/37768