Direct-write electron beam fabrication of optically active diamond nanostructures

Publication Type:
Conference Proceeding
Citation:
2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014, 2014, pp. 6 - 10
Issue Date:
2014-02-10
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© 2014 IEEE. Controlled fabrication of semiconductor nanostructures is a prerequisite step in the engineering of next generation photonic and optoelectronic devices. Here we describe two advances in electron beam processing of single crystal diamond: (i) chemical dry etching of optically active nanostructures, and (ii) chemical switching of the charge state of nitrogen-vacancy centers by surface fluorination. Etching and fluorination are realized by irradiating diamond by kiloelectronvolt electrons at room temperature in the presence of H 2 O and NF 3 vapor, respectively. The techniques do not generate defects that quench luminescence, thereby enabling the fabrication and editing of optically active nanostructures and diamond-based devices.
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