Plasmonic 'top-hat' nano-star arrays by electron beam lithography

Zhu, S; Cheng, HH; Blakey, I; Stokes, N; Ostrikov, K; Cortie, M

Plasmonic 'top-hat' nano-star arrays by electron beam lithography

Zhu, S Cheng, HH Blakey, I Stokes, N Ostrikov, K Cortie, M

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Publication Type:: Journal Article
Citation:: Microelectronic Engineering, 2015, 139 pp. 13 - 18
Issue Date:: 2015-05-01

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Field	Value	Language
dc.contributor.author	Zhu, S	en_US
dc.contributor.author	Cheng, HH	en_US
dc.contributor.author	Blakey, I	en_US
dc.contributor.author	Stokes, N	en_US
dc.contributor.author	Ostrikov, K	en_US
dc.contributor.author	Cortie, M https://orcid.org/0000-0003-3202-6398	en_US
dc.date.available	2020-05-25T19:05:31Z
dc.date.issued	2015-05-01	en_US
dc.identifier.citation	Microelectronic Engineering, 2015, 139 pp. 13 - 18	en_US
dc.identifier.issn	0167-9317	en_US
dc.identifier.uri	http://hdl.handle.net/10453/41213
dc.description.abstract	© 2015 Published by Elsevier B.V.. Lithography techniques play an important role in the fabrication of nanoscale functional devices. In electron beam lithography (EBL) the optimum dose of electron irradiation is a critical parameter. In this paper, we first identify suitable EBL fabrication parameters by writing patterns with different sizes, periods and electron radiation doses. After finding suitable fabrication parameters, we show how five-pointed gold nanostructures with electric field-enhancing 'top hats' can be fabricated using EBL. Reflectance data of these arrays is measured in order to assess their potential applications in biosensing arrays	en_US
dc.relation.ispartof	Microelectronic Engineering	en_US
dc.relation.isbasedon	10.1016/j.mee.2015.04.084	en_US
dc.subject.classification	Applied Physics	en_US
dc.title	Plasmonic 'top-hat' nano-star arrays by electron beam lithography	en_US
dc.type	Journal Article
utslib.citation.volume	139	en_US
utslib.for	0906 Electrical and Electronic Engineering	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0299 Other Physical Sciences	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
utslib.copyright.status	open_access
pubs.publication-status	Published	en_US
pubs.volume	139	en_US

Abstract:

© 2015 Published by Elsevier B.V.. Lithography techniques play an important role in the fabrication of nanoscale functional devices. In electron beam lithography (EBL) the optimum dose of electron irradiation is a critical parameter. In this paper, we first identify suitable EBL fabrication parameters by writing patterns with different sizes, periods and electron radiation doses. After finding suitable fabrication parameters, we show how five-pointed gold nanostructures with electric field-enhancing 'top hats' can be fabricated using EBL. Reflectance data of these arrays is measured in order to assess their potential applications in biosensing arrays

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http://hdl.handle.net/10453/41213