Effect of target-substrate working distance on magnetron sputter deposition of nanostructured titanium aluminium nitride coatings

Wuhrer, R Yeung, WY

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Field	Value	Language
dc.contributor.author	Wuhrer, R	en_US
dc.contributor.author	Yeung, WY	en_US
dc.date.issued	2003-08-01	en_US
dc.identifier.citation	SCRIPTA MATERIALIA, 2003, 49 (3), pp. 199 - 205 (7)	en_US
dc.identifier.issn	1359-6462	en_US
dc.identifier.uri	http://hdl.handle.net/10453/4239
dc.language	English	en_US
dc.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en_US
dc.relation.ispartof	SCRIPTA MATERIALIA	en_US
dc.relation.isbasedon	10.1016/S1359-6462(03)00264-1	en_US
dc.subject.classification	Materials	en_US
dc.title	Effect of target-substrate working distance on magnetron sputter deposition of nanostructured titanium aluminium nitride coatings	en_US
dc.type	Journal Article
utslib.citation.volume	3	en_US
utslib.citation.volume	49	en_US
utslib.for	0912 Materials Engineering	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0913 Mechanical Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
utslib.copyright.status	closed_access
pubs.issue	3	en_US
pubs.publication-status	Published	en_US
pubs.volume	49	en_US

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