Modelling of nitrogen deposition pressure effect on grain size development and mechanical properties of nanocrystalline ternary nitride coatings

Trans Tech Publications Ltd
Publication Type:
Journal Article
Materials Science Forum, 2007, 539-543 pp. 1177 - 1182
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Development of complez ternary nitride coatings has attracted significant industrial interest in recent years. In deposition of complex ternary nitride coatings, the nitrogen deposition pressure plays an important role in structural evolution of the coatings leading to development of different mechanical porperties. This paper summarises some successful analyses by the authors on the relationships amongst the deposition rate, grain size and hardness of the coatings against the nitrogen deposition pressure. It has been established that as the nitrogen pressure decreases, the deposition rate of the coatings increases and the grain size decereases. Hardness of the coatings increases due to the development of a refined and densified coatings structure. Taking into account of the reaction kinetics at the targets the interactions of the sputtered atoms occurred in tehir transfer to the substrate, the reaction kinetics at the substrate the target m,aterial characteristics and the geometric arrangement of the sputter magnetron configuration, modelling to the relationships of deposition rate with nitrogen deposition pressure, grain size with deposition rate and hardness with grain size have been succssfully established in this study.
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