Optical response in nanostructured thin metal films with dielectric over-layers

Smith, GB; Maaroof, AI

Optical response in nanostructured thin metal films with dielectric over-layers

Smith, GB

Maaroof, AI

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Publication Type:: Journal Article
Citation:: Optics Communications, 2004, 242 (4-6), pp. 383 - 392
Issue Date:: 2004-12-08

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Field	Value	Language
dc.contributor.author	Smith, GB https://orcid.org/0000-0002-6985-2880	en_US
dc.contributor.author	Maaroof, AI	en_US
dc.date.issued	2004-12-08	en_US
dc.identifier.citation	Optics Communications, 2004, 242 (4-6), pp. 383 - 392	en_US
dc.identifier.issn	0030-4018	en_US
dc.identifier.uri	http://hdl.handle.net/10453/435
dc.description.abstract	Thin metal films which contain nano-size pores yield higher than expected transmittance and larger than expected times for transmission of near infra red radiation. An optically equivalent layer with complex refractive index (n, k) can model measured specular transmittance and reflectance, when scattering is weak. The way surface plasmon effects impact on these measured indices is considered. A strongly elevated n* is linked to t rad the time for a surface plasmon to re-radiate and hence delay transmission times, and reduced imaginary part k, to resonant channelling via voids. Measurement of n thus allows an estimate of t rad. The sensitivity of (n, k) to surface effects is illustrated using an insulating overlayer to modify the surface states. Resultant measured changes in n, k are substantial. Results are for two nanostructured metal systems characterised with 400,000× scanning electron microscopy. © 2004 Elsevier B.V. All rights reserved.	en_US
dc.relation.ispartof	Optics Communications	en_US
dc.relation.isbasedon	10.1016/j.optcom.2004.09.001	en_US
dc.subject.classification	Optoelectronics & Photonics	en_US
dc.title	Optical response in nanostructured thin metal films with dielectric over-layers	en_US
dc.type	Journal Article
utslib.citation.volume	4-6	en_US
utslib.citation.volume	242	en_US
utslib.for	0205 Optical Physics	en_US
utslib.for	0906 Electrical and Electronic Engineering	en_US
utslib.for	1005 Communications Technologies	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
utslib.copyright.status	closed_access
pubs.issue	4-6	en_US
pubs.publication-status	Published	en_US
pubs.volume	242	en_US

Abstract:

Thin metal films which contain nano-size pores yield higher than expected transmittance and larger than expected times for transmission of near infra red radiation. An optically equivalent layer with complex refractive index (n*, k*) can model measured specular transmittance and reflectance, when scattering is weak. The way surface plasmon effects impact on these measured indices is considered. A strongly elevated n* is linked to t rad the time for a surface plasmon to re-radiate and hence delay transmission times, and reduced imaginary part k*, to resonant channelling via voids. Measurement of n* thus allows an estimate of t rad. The sensitivity of (n*, k*) to surface effects is illustrated using an insulating overlayer to modify the surface states. Resultant measured changes in n*, k* are substantial. Results are for two nanostructured metal systems characterised with 400,000× scanning electron microscopy. © 2004 Elsevier B.V. All rights reserved.

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http://hdl.handle.net/10453/435