Multi-axis retarder arrays by masked oblique deposition

Publisher:
American Vacuum Society / American Institute of Physics
Publication Type:
Journal Article
Citation:
Journal of Vacuum Science and Technology B, 2005, 23 (4), pp. 1398 - 1404
Issue Date:
2005-01
Full metadata record
Files in This Item:
Filename Description Size
2006006508.pdf785.15 kB
Adobe PDF
We report a technique for single-deposition production of arrays with differently oriented nano-structured elements, which we optimize for application to form-birefringent retarder arrays. The technique involves masking of oblique physical vapor deposition, manipulating the local availability of vapor angles to create spatially variant properties in the structured coating. We have designed a variety of retarder arrays using symmetry considerations, and constructed a selection based on suitability for spatially multiplexed complete-Stokes polarimetry. In particular, we emphasize square lattice designs with a two-by-two repeat unit, consisting of three retarders with azimuths at 0°, 45° and 90° and a zero-retardation element. The silicon retarder arrays were tested using visible-wavelength transmission techniques which confirm the success of the method. Finally, we discuss some considerations for application of the technique to microlithography, and we infer a lateral resolution limit related to the coating thickness.
Please use this identifier to cite or link to this item: