Direct nanoengineering and lithographic patterning of optically anisotropic thin films

Publication Type:
Journal Article
Citation:
Microelectronic Engineering, 2001, 57-58 pp. 833 - 836
Issue Date:
2001-01-01
Metrics:
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The deposition and patterning of anisotropic thin films were discussed. Two distinct methods of patterning were used: lift-off, and reactive ion etching (RIE). The results showed that the patterned anisotropic films can be used in devices such as imaging polarimeters. © 2001 Elsevier Science B.V.
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