Direct nanoengineering and lithographic patterning of optically anisotropic thin films

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Journal Article
Microelectronic Engineering, 2001, 57-58 pp. 833 - 836
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Biaxial and chiral thin films formed by oblique vapour deposition are patterned using standard photolithography. In one example 5 ?m wide half-wave plates are fabricated by reactive ion etching a biaxial silicon film.
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