Thin films of ZnO and ZnMnO by atomic layer epitaxy

Wojcik, A; Kopalko, K; Godlewski, M; Lusakowska, E; Guziewicz, E; Minikayev, R; Paszkowicz, W; Swiatek, K; Klepka, M; Jakiela, R; Kiecana, M; Sawicki, M; Dybko, K; Phillips, M

Thin films of ZnO and ZnMnO by atomic layer epitaxy

Wojcik, A Kopalko, K Godlewski, M Lusakowska, E Guziewicz, E Minikayev, R Paszkowicz, W Swiatek, K Klepka, M Jakiela, R Kiecana, M Sawicki, M Dybko, K Phillips, M

Publisher:: Institute of Physics, Wroclaw University of Technology and SPIE - The International Society for Opti
Publication Type:: Journal Article
Citation:: Optica Applicata, 2005, 35 (3), pp. 413 - 417
Issue Date:: 2005-01

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Field	Value	Language
dc.contributor.author	Wojcik, A	en_US
dc.contributor.author	Kopalko, K	en_US
dc.contributor.author	Godlewski, M	en_US
dc.contributor.author	Lusakowska, E	en_US
dc.contributor.author	Guziewicz, E	en_US
dc.contributor.author	Minikayev, R	en_US
dc.contributor.author	Paszkowicz, W	en_US
dc.contributor.author	Swiatek, K	en_US
dc.contributor.author	Klepka, M	en_US
dc.contributor.author	Jakiela, R	en_US
dc.contributor.author	Kiecana, M	en_US
dc.contributor.author	Sawicki, M	en_US
dc.contributor.author	Dybko, K	en_US
dc.contributor.author	Phillips, M	en_US
dc.date.issued	2005-01	en_US
dc.identifier.citation	Optica Applicata, 2005, 35 (3), pp. 413 - 417	en_US
dc.identifier.issn	0078-5466	en_US
dc.identifier.uri	http://hdl.handle.net/10453/8396
dc.description.abstract	We discuss properties of thin films of ZnO and ZnMnO grown with atomic layer epitaxy using new, organic zinc and manganese precursors. Several characterization techniques, including X-ray diffraction, atomic force microscopy, scanning electron microscopy, cathodoluminescence, superconducting quantum interfernece device (SQUID) and electron spin resonance, show good topography of the films and their advantageous optical and magnetic properties.	en_US
dc.format	Y	en_US
dc.publisher	Institute of Physics, Wroclaw University of Technology and SPIE - The International Society for Opti	en_US
dc.relation.ispartof	Optica Applicata	en_US
dc.subject.classification	Applied Physics	en_US
dc.title	Thin films of ZnO and ZnMnO by atomic layer epitaxy	en_US
dc.type	Journal Article
utslib.citation.volume	3	en_US
utslib.citation.volume	35	en_US
utslib.for	0912 Materials Engineering	en_US
utslib.for	0204 Condensed Matter Physics	en_US
dc.location.activity	Szklarska, POLAND
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - CCET - Centre for Clean Energy Technology
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	open_access
pubs.consider-herdc	false	en_US
pubs.issue	3	en_US
pubs.notes	OK - SAM	en_US
pubs.volume	35	en_US

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Abstract:

We discuss properties of thin films of ZnO and ZnMnO grown with atomic layer epitaxy using new, organic zinc and manganese precursors. Several characterization techniques, including X-ray diffraction, atomic force microscopy, scanning electron microscopy, cathodoluminescence, superconducting quantum interfernece device (SQUID) and electron spin resonance, show good topography of the films and their advantageous optical and magnetic properties.

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http://hdl.handle.net/10453/8396