Argon plasma immersion ion implantation of polystyrene films

Elsevier Science Bv
Publication Type:
Journal Article
Nuclear Instruments & Methods In Physics Research Section B-Beam Interactions With Materials And Atoms, 2008, 266 (7), pp. 1074 - 1084
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Plasma immersion ion implantation (PIII), using bias voltages of 5, 10, 15 and 20 kV in an argon plasma and fluences in the range of 2 x 10(14)-2 x 10(16) ions/cm(2), was applied to 100 nm polystyrene films coated on silicon wafer substrates. The etching
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