Nanostructured TiN thin films suitable for medical applications

Publication Type:
Journal Article
Citation:
Materials Forum, 2007, 32 pp. 129 - 136
Issue Date:
2007-12-01
Metrics:
Full metadata record
Files in This Item:
Filename Description Size
Thumbnail2008000793OK.pdf624.97 kB
Adobe PDF
Titanium nitride thin films are widely used in biomedical implants because of their biocompatibility, good mechanical properties and high corrosion resistance. Titanium nitride (TiN) thin films on silicon and glass substrates were prepared using a dc magnetron sputtering system under conditions of systematically varying the nitrogen pressure and titanium magnetron power. The nano-structure and microstructure of the coatings was examined using a scanning electron microscope and atomic force microscope. The present studies show that the surface structure, grain size, deposition rate and microhardness of the coatings are strongly dependent on the nitrogen pressure and titanium magnetron power. The grain diameter increased from 35 to 100 nm with the increase in nitrogen partial pressure from 0.4 to 1.0 mTorr. The optimal nitrogen partial pressure found for making gold colour TiN thin films and increased hardness (about 2550 Vickers number) was determined to be between 0.4 - 0.6 mTorr. The grain size was found to decrease from 60 to 28 nm and the microhardness increased from 1600 to 2550 (Vickers number) as the titanium magnetron power increased from 100 to 250 W. © Institute of Materials Engineering Australasia Ltd.
Please use this identifier to cite or link to this item: