Cryogenic electron beam induced chemical etching.

Publisher:
American Chemical Society
Publication Type:
Journal Article
Citation:
ACS Applied Materials and Interfaces, 2014, 6 (21), pp. 18457 - 18460
Issue Date:
2014-11
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Cryogenic cooling is used to enable efficient, gas-mediated electron beam induced etching (EBIE) in cases where the etch rate is negligible at room and elevated substrate temperatures. The process is demonstrated using nitrogen trifluoride (NF3) as the etch precursor, and Si, SiO2, SiC, and Si3N4 as the materials volatilized by an electron beam. Cryogenic cooling broadens the range of precursors that can be used for EBIE, and enables high-resolution, deterministic etching of materials that are volatilized spontaneously by conventional etch precursors as demonstrated here by NF3 and XeF2 EBIE of silicon.
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